Publication result detail

Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures

HRDÝ, R.; MACHÁČKOVÁ, M.; DRBOHLAVOVÁ, J.; HUBÁLEK, J.

Original Title

Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures

English Title

Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures

Type

Paper in proceedings (conference paper)

Original Abstract

This work is focused on the effect of thin evaporated aluminum film anneling at different temperatures. In our case, the P-type silicon wafers were used as substrate for evaporation of pure aluminum. Then, each wafer was annealed in nitrogen atmosphere at temperature range of 300-400 Celsius degree. All samples were analyzed by SEM and AFM.

English abstract

This work is focused on the effect of thin evaporated aluminum film anneling at different temperatures. In our case, the P-type silicon wafers were used as substrate for evaporation of pure aluminum. Then, each wafer was annealed in nitrogen atmosphere at temperature range of 300-400 Celsius degree. All samples were analyzed by SEM and AFM.

Keywords

anodization, alumina, annealing, crystal structure

Key words in English

anodization, alumina, annealing, crystal structure

Authors

HRDÝ, R.; MACHÁČKOVÁ, M.; DRBOHLAVOVÁ, J.; HUBÁLEK, J.

Released

10.09.2009

Publisher

Ing. Zdeněk Novotný, CSc.

Location

Brno

ISBN

978-80-214-3717-3

Book

EDS 09 IMAPS CS International Conference Proceedings

Pages from

214

Pages to

218

Pages count

5

BibTex

@inproceedings{BUT30083,
  author="Radim {Hrdý} and Marina {Macháčková} and Jana {Drbohlavová} and Jaromír {Hubálek}",
  title="Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures",
  booktitle="EDS 09 IMAPS CS International Conference Proceedings",
  year="2009",
  number="1",
  pages="214--218",
  publisher="Ing. Zdeněk Novotný, CSc.",
  address="Brno",
  isbn="978-80-214-3717-3"
}