Publication result detail

High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes

SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T.

Original Title

High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes

English Title

High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes

Type

WoS Article

Original Abstract

Hall probes play a critical role in industrial applications such as electrical compasses, current sensors, and motion detectors; however, their performance often deteriorates at high temperatures. This study presents a magnetic-field probe with an ultrahigh sensitivity of 880 Omega/T at 150 degrees C, achieved using a graphene Hall bar integrated into a field-effect transistor (FET) architecture. To attain this exceptional sensitivity at elevated temperatures, careful control of doping, passivation, and manufacturing defects is essential. The doping level is optimized by adjusting the gate voltage to maintain the carrier concentration near the charge neutrality point (CNP). Further improvements in sensor response at high temperatures, as well as nearly a 2-fold increase in sensitivity at room temperature, are realized through polymer passivation of graphene. In contrast, it is demonstrated that patterning graphene into a narrower channel can increase the number of defects, which reduces the Hall probe's sensitivity. These findings demonstrate the potential of CVD graphene as a durable and high-performance material for Hall probes in challenging environments.

English abstract

Hall probes play a critical role in industrial applications such as electrical compasses, current sensors, and motion detectors; however, their performance often deteriorates at high temperatures. This study presents a magnetic-field probe with an ultrahigh sensitivity of 880 Omega/T at 150 degrees C, achieved using a graphene Hall bar integrated into a field-effect transistor (FET) architecture. To attain this exceptional sensitivity at elevated temperatures, careful control of doping, passivation, and manufacturing defects is essential. The doping level is optimized by adjusting the gate voltage to maintain the carrier concentration near the charge neutrality point (CNP). Further improvements in sensor response at high temperatures, as well as nearly a 2-fold increase in sensitivity at room temperature, are realized through polymer passivation of graphene. In contrast, it is demonstrated that patterning graphene into a narrower channel can increase the number of defects, which reduces the Hall probe's sensitivity. These findings demonstrate the potential of CVD graphene as a durable and high-performance material for Hall probes in challenging environments.

Keywords

graphene; Hall probe; field-effect transistor; sensitivity; high temperature

Key words in English

graphene; Hall probe; field-effect transistor; sensitivity; high temperature

Authors

SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T.

Released

18.06.2025

Publisher

AMER CHEMICAL SOC

Location

WASHINGTON

ISBN

2637-6113

Periodical

ACS Applied Electronic Materials

Volume

7

Number

13

State

United States of America

Pages from

5889

Pages to

5897

Pages count

9

URL

BibTex

@article{BUT198511,
  author="Linda {Supalová} and Miroslav {Bartošík} and Vojtěch {Švarc} and Jindřich {Mach} and Jakub {Piastek} and Ondřej {Špaček} and Martin {Konečný} and Tomáš {Šikola}",
  title="High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes",
  journal="ACS Applied Electronic Materials",
  year="2025",
  volume="7",
  number="13",
  pages="5889--5897",
  doi="10.1021/acsaelm.5c00351",
  issn="2637-6113",
  url="https://pubs.acs.org/doi/10.1021/acsaelm.5c00351"
}