Publication result detail

Optical Properties of Yttrium Ferrite Films Prepared by Pulse Laser Deposition

SOBOLA, D.; FAWAEER, S.; KOČKOVÁ, P.; SCHUBERT, R.; DALLAEV, R.; TRČKA, T.

Original Title

Optical Properties of Yttrium Ferrite Films Prepared by Pulse Laser Deposition

English Title

Optical Properties of Yttrium Ferrite Films Prepared by Pulse Laser Deposition

Type

WoS Article

Original Abstract

This study investigates the optical properties of yttrium ferrite thin films fabricated via pulse laser deposition. Yttrium orthoferrite, a ferrimagnetic material known for its potential applications in spintronics and photonics, was deposited on single-crystal substrates under controlled conditions to analyze its optical characteristics. The influence of deposition time on the film quality and optical properties was examined. Atomic force microscopy in contact mode revealed surface roughness variations up to 35 nm, indicating the films' ability to cover substrate defects. Reflectance measurements determined the optical band gap, which decreased from 3.17 eV for thinner films (44 nm) to 2.91 eV for thicker films (93 nm). Forbidden electronic transitions were also observed, attributed to heteroepitaxial growth and phonon interactions. These results demonstrate the effect of film thickness on morphology and optical properties, making YFeO3 films promising for a range of optoelectronic applications.

English abstract

This study investigates the optical properties of yttrium ferrite thin films fabricated via pulse laser deposition. Yttrium orthoferrite, a ferrimagnetic material known for its potential applications in spintronics and photonics, was deposited on single-crystal substrates under controlled conditions to analyze its optical characteristics. The influence of deposition time on the film quality and optical properties was examined. Atomic force microscopy in contact mode revealed surface roughness variations up to 35 nm, indicating the films' ability to cover substrate defects. Reflectance measurements determined the optical band gap, which decreased from 3.17 eV for thinner films (44 nm) to 2.91 eV for thicker films (93 nm). Forbidden electronic transitions were also observed, attributed to heteroepitaxial growth and phonon interactions. These results demonstrate the effect of film thickness on morphology and optical properties, making YFeO3 films promising for a range of optoelectronic applications.

Keywords

yttrium orthoferrite; plasma laser deposition; optical properties; thin films; bandgap; optoelectronics

Key words in English

yttrium orthoferrite; plasma laser deposition; optical properties; thin films; bandgap; optoelectronics

Authors

SOBOLA, D.; FAWAEER, S.; KOČKOVÁ, P.; SCHUBERT, R.; DALLAEV, R.; TRČKA, T.

RIV year

2025

Released

18.11.2024

Publisher

MDPI

Location

BASEL

ISBN

2079-6412

Periodical

Coatings, MDPI

Volume

14

Number

11

State

Swiss Confederation

Pages from

1

Pages to

17

Pages count

17

URL

https://www.mdpi.com/2079-6412/14/11/1464

Full text in the Digital Library

http://hdl.handle.net/11012/250854

BibTex

@article{BUT197333,
  author="Dinara {Sobola} and Saleh Hekmat Saleh {Fawaeer} and Pavla {Neubauerová} and Richard {Schubert} and Rashid {Dallaev} and Tomáš {Trčka}",
  title="Optical Properties of Yttrium Ferrite Films Prepared by Pulse Laser Deposition",
  journal="Coatings, MDPI",
  year="2024",
  volume="14",
  number="11",
  pages="1--17",
  doi="10.3390/coatings14111464",
  issn="2079-6412",
  url="https://www.mdpi.com/2079-6412/14/11/1464"
}

Documents

coatings-14-01464