Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

Chemical vapor deposition: a potential tool for wafer scale growth of two-dimensional layered materials

WoS Article

The rapidly growing demand for high-performance and low-power electronic and photonic devices has driven attention towards novel two-dimensional (2D) layered materials. In this regard, 2D layered materials, including graphene, molybdenum disulfide (MoS2), and newly discovered phosphorene, have the potential to take over the existing semiconductor industry due to their intriguing features, such as excellent electrical conductivity, strong light-matter interaction, and especially the ability to scale down the resulting device to the atomic level. However, to explore the full potential of these materials in various technological applications, it is essential to develop a large-scale synthesis method that can provide uniform, defect-free thin film. The chemical vapor deposition (CVD) technique has been proven to produce large-scale and less defective 2D crystals with reasonably good quality and uniformity compared to other elaboration techniques, such as molecular beam epitaxy. This article discusses whether CVD may improve 2D layered materials growth, including graphene and MoS2, and whether it can be used to grow phosphorene. Only a few attempts have been made using CVD-like methods to grow phosphorene directly on the substrate. Still, one has to go long to establish a proper CVD method for phosphorene synthesis.

The rapidly growing demand for high-performance and low-power electronic and photonic devices has driven attention towards novel two-dimensional (2D) layered materials. In this regard, 2D layered materials, including graphene, molybdenum disulfide (MoS2), and newly discovered phosphorene, have the potential to take over the existing semiconductor industry due to their intriguing features, such as excellent electrical conductivity, strong light-matter interaction, and especially the ability to scale down the resulting device to the atomic level. However, to explore the full potential of these materials in various technological applications, it is essential to develop a large-scale synthesis method that can provide uniform, defect-free thin film. The chemical vapor deposition (CVD) technique has been proven to produce large-scale and less defective 2D crystals with reasonably good quality and uniformity compared to other elaboration techniques, such as molecular beam epitaxy. This article discusses whether CVD may improve 2D layered materials growth, including graphene and MoS2, and whether it can be used to grow phosphorene. Only a few attempts have been made using CVD-like methods to grow phosphorene directly on the substrate. Still, one has to go long to establish a proper CVD method for phosphorene synthesis.

2D materials; CVD; graphene; MoS2; black phosphorus; phosphorene

2D materials; CVD; graphene; MoS2; black phosphorus; phosphorene

EL HAMMOUMI, M.; CHAUDHARY, V.; NEUGEBAUER, P.; EL FATIMY, A.

2023

24.11.2022

IOP Publishing Ltd

BRISTOL

1361-6463

JOURNAL OF PHYSICS D-APPLIED PHYSICS

55

47

United Kingdom of Great Britain and Northern Ireland

18

https://iopscience.iop.org/article/10.1088/1361-6463/ac928d

http://hdl.handle.net/11012/209153

El_Hammoumi_2022_J._Phys._D _Appl._Phys._55_473001