Publication detail

High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides

GRYSZEL, M. JAKEŠOVÁ, M. LEDNICKÝ, T. GLOWACKI, E.

Original Title

High-Capacitance Nanoporous Noble Metal Thin Films via Reduction of Sputtered Metal Oxides

Type

journal article in Web of Science

Language

English

Original Abstract

Increasing the electrochemical surface area of noble metal electrodes is vital for many applications, including catalysis and bioelectronics. Herein, a method is presented for obtaining porous noble metal thin films via reactive magnetron sputtering of noble metal oxides, MOx, followed by their reduction using chemical reducers or electrochemical current. Variation of reduction conditions yields a range of different electrochemical and morphological properties. This method for obtaining porous noble metals is rapid, facile, and compatible with microfabrication processes. The resulting metallic films are porous and have competitively high capacitance and low impedance.

Keywords

electrochemistry; magnetron sputtering; microelectrodes; noble metals; porous metals

Authors

GRYSZEL, M.; JAKEŠOVÁ, M.; LEDNICKÝ, T.; GLOWACKI, E.

Released

1. 2. 2022

Publisher

WILEY

Location

HOBOKEN

ISBN

2196-7350

Periodical

Advanced Materials Interfaces

Year of study

9

Number

5

State

Federal Republic of Germany

Pages from

2101973-1

Pages to

2101973-6

Pages count

6

URL

https://onlinelibrary.wiley.com/doi/10.1002/admi.202101973

Full text in the Digital Library

http://hdl.handle.net/11012/209169