Přístupnostní navigace
E-application
Search Search Close
Publication result detail
Přikryl, R., Čech, V., Hedbavny, P.
Original Title
Capacitive coupling plasma system for thin film deposition
English Title
Type
Paper in proceedings (conference paper)
Original Abstract
Plasma polymerization is a powerful tool for deposition of thin films whose physicochemical properties can be controlled in wide ranges and thus the technology enables tailoring of the material with respect to an application. However, a success of the coating technique depends on a suitable technological system, as the vacuum quality and film reproducibility are the crucial parameters. We have developed a new capacitive coupling system for creative design and application of complex film systems in smart materials. The internal setup of our deposition chamber using plan-parallel electrodes was derived from a typical capacitive coupling system, but our apparatus was equipped with many non-standard components.
English abstract
Keywords
PECVD, plasma technology, capacitive coupling system
Key words in English
Authors
Released
01.01.2004
Location
Itálie
Book
1st Workshop "Structuring of Polymers"
Pages from
96
Pages to
97
Pages count
1
BibTex
@inproceedings{BUT17610, author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny}", title="Capacitive coupling plasma system for thin film deposition", booktitle="1st Workshop {"}Structuring of Polymers{"}", year="2004", pages="96--97", address="Itálie" }