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NG, S.; ZAZPE MENDIOROZ, R.; RODRIGUEZ PEREIRA, J.; MICHALIČKA, J.; MACÁK, J.; PUMERA, M.
Original Title
Atomic layer deposition of photoelectrocatalytic material on 3D-printed nanocarbon structures
English Title
Type
WoS Article
Original Abstract
3D-printing is an excellent tool for the prototyping and fabrication of a variety of devices. The ability to rapidly create on demand structures opens the vast possibilities for the innovations in catalysis and energy conversion/storage devices. The major bottleneck is that the materials which are suitable for 3D-printing usually do not possess the required energy conversion/storage ability. Atomic layer deposition (ALD) strategically offers homogeneous and conformal deposition of functional layers without compromising the 3D topography. Here, we show that readily fabricated fused deposition modeling extruded nanocarbon/polylactic acid (PLA) electrodes can be modified by a photoelectrocatalytic material with atomic precision. We use an archetypal material, MoS2, with high electrocatalytic hydrogen evolution reaction (HER) activity, whilst possesses high photons absorption in the visible spectral region. We optimized the ALD process at low temperature to coat 3D-printed nanocarbon/PLA electrodes with different number of MoS2 ALD cycles for photoelectrocatalytic HER. We present for the first time, the feasibility of low temperature transition metal dichalcogenide coatings on 3D-printed nanocarbon surface, unequivocally elevate the benchmark of functional coatings by ALD on any 3D-printed platforms.
English abstract
Keywords
Atomic layer deposition, 3D-printing
Key words in English
Authors
RIV year
2022
Released
14.04.2021
Publisher
ROYAL SOC CHEMISTRY
Location
CAMBRIDGE
ISBN
2050-7488
Periodical
Journal of Materials Chemistry A
Volume
9
Number
18
State
United Kingdom of Great Britain and Northern Ireland
Pages from
11405
Pages to
11414
Pages count
10
URL
https://pubs.rsc.org/en/content/articlelanding/2021/TA/D1TA01467F#!divAbstract
BibTex
@article{BUT171841, author="Siow Woon {Ng} and Raúl {Zazpe Mendioroz} and Jhonatan {Rodriguez Pereira} and Jan {Michalička} and Jan {Macák} and Martin {Pumera}", title="Atomic layer deposition of photoelectrocatalytic material on 3D-printed nanocarbon structures", journal="Journal of Materials Chemistry A", year="2021", volume="9", number="18", pages="11405--11414", doi="10.1039/d1ta01467f", issn="2050-7488", url="https://pubs.rsc.org/en/content/articlelanding/2021/TA/D1TA01467F#!divAbstract" }