Low temperature selective growth of GaN single crystals on pre-patterned Si substrates

Low temperature selective growth of GaN single crystals on pre-patterned Si substrates

WoS Article

We report on a hybrid method for fabrication of arrays of GaN nanocrystals by low-temperature UHV selective growth on pre-patterned silicon substrates covered by native oxide. Patterning of the substrates was performed by using a gallium focused ion beam (FIB). To get GaN nanocrystals at specific positions, Ga droplets were created at FIB patterned sites by evaporation of Ga atoms at 280°C substrate temperature first, and then modified by their post-nitridation using an ultra-low energy (50eV) nitrogen ion–beam at a sample temperature of 200 °C. To get larger arrays of GaN nanocrystals (≈150nm and 200nm in diameter), such a sequential process was repeated in several cycles at slightly modified operation conditions. The quality of the nanocrystals was checked by measurement of their photoluminescence properties which proved the occurrence of the peak of a band edge emission at around 367nm (3.38 eV).

We report on a hybrid method for fabrication of arrays of GaN nanocrystals by low-temperature UHV selective growth on pre-patterned silicon substrates covered by native oxide. Patterning of the substrates was performed by using a gallium focused ion beam (FIB). To get GaN nanocrystals at specific positions, Ga droplets were created at FIB patterned sites by evaporation of Ga atoms at 280°C substrate temperature first, and then modified by their post-nitridation using an ultra-low energy (50eV) nitrogen ion–beam at a sample temperature of 200 °C. To get larger arrays of GaN nanocrystals (≈150nm and 200nm in diameter), such a sequential process was repeated in several cycles at slightly modified operation conditions. The quality of the nanocrystals was checked by measurement of their photoluminescence properties which proved the occurrence of the peak of a band edge emission at around 367nm (3.38 eV).

GaN; Deposition; Selective growth; Low energy ions; Nanocrystals; Photoluminescence

GaN; Deposition; Selective growth; Low energy ions; Nanocrystals; Photoluminescence

MACH, J.; PIASTEK, J.; MANIŠ, J.; ČALKOVSKÝ, V.; ŠAMOŘIL, T.; FLAJŠMANOVÁ, J.; BARTOŠÍK, M.; VOBORNÝ, S.; KONEČNÝ, M.; ŠIKOLA, T.

2020

14.08.2019

0169-4332

APPLIED SURFACE SCIENCE

497

143705

Kingdom of the Netherlands

1

7

7

https://www.sciencedirect.com/science/article/pii/S0169433219325024

Mach - ApplSurfSci