Publication result detail

Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology

PROKEŠ, T.; MOURALOVÁ, K.; ZAHRADNÍČEK, R.; BEDNÁŘ, J.; KALIVODA, M.

Original Title

Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology

English Title

Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology

Type

Chapter in a book

Original Abstract

The aim of this study was to carry out a planned experiment (DoE) in order to find a suitable combination of deposition parameters to increase the hardness of the coating. In a 20-round experiment, parameters of chamber pressure, gas flow and the power of an RF source were gradually changed. Subsequently, a micro hardness analysis was carried out using the Berkovich method. Using the DoE method, a combination of parameters was detected within which a comparable hardness of the coating was achieved as with doping of the hydrogen atoms coating to increase the number of Sp3 carbon bonds. Within the indentation test, a scratch test was carried out to determine the normal force required to break the coating.

English abstract

The aim of this study was to carry out a planned experiment (DoE) in order to find a suitable combination of deposition parameters to increase the hardness of the coating. In a 20-round experiment, parameters of chamber pressure, gas flow and the power of an RF source were gradually changed. Subsequently, a micro hardness analysis was carried out using the Berkovich method. Using the DoE method, a combination of parameters was detected within which a comparable hardness of the coating was achieved as with doping of the hydrogen atoms coating to increase the number of Sp3 carbon bonds. Within the indentation test, a scratch test was carried out to determine the normal force required to break the coating.

Keywords

DLC, RF PECVD, Coating hardness, scrath test, DoE, Berkovich

Key words in English

DLC, RF PECVD, Coating hardness, scrath test, DoE, Berkovich

Authors

PROKEŠ, T.; MOURALOVÁ, K.; ZAHRADNÍČEK, R.; BEDNÁŘ, J.; KALIVODA, M.

RIV year

2021

Released

11.03.2021

Publisher

Springer International Publishing

Location

Švýcarsko

ISBN

978-3-030-61659-5

Book

Recent Advances in Soft Computing and Cybernetics

ISBN

1434-9922

Periodical

Studies in Fuzziness and Soft Computing

Volume

2021

Number

403

State

unknown

Pages from

53

Pages to

62

Pages count

10

URL

https://link.springer.com/chapter/10.1007/978-3-030-61659-5_5

BibTex

@inbook{BUT157677,
  author="Tomáš {Prokeš} and Kateřina {Mouralová} and Radim {Zahradníček} and Josef {Bednář} and Milan {Kalivoda}",
  title="Optimization of Deposition Parameters of a DLC Layer Using (RF) PECVD Technology",
  booktitle="Recent Advances in Soft Computing and Cybernetics",
  year="2021",
  publisher="Springer International Publishing",
  address="Švýcarsko",
  pages="53--62",
  doi="10.1007/978-3-030-61659-5\{_}5https://link.springer.com/chapter/10.1007/978-3-030-61659-5\{_}5",
  isbn="978-3-030-61659-5",
  url="https://link.springer.com/chapter/10.1007/978-3-030-61659-5_5"
}