Epitaxní vrstva AlN nadeponovaná vysokoteplotní aparaturou MOCVD

Epitaxy film of AlN deposited in high-temperature MOCVD aparatus

Functioning sample

SEM, XRD, XPS analýza a elipsometrie epitaxní vrstvy AlN rostlé na safírovém substrátu metodou MOCVD.

SEM, XRD, XPS, analysis and Ellipsometry of epitaxy AlN film growth on saphire substrate by MOCVD method.

GaN, epitaxy, SEM, XRD, XPS, Ellipsometry, MOCVD

GaN, epitaxy, SEM, XRD, XPS, Ellipsometry, MOCVD

CEITEC, Research group RG102

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