Applied result detail

Epitaxní vrstva InN nadeponovaná nízkoteplotní aparaturou MOCVD

ŠIK, O.; MÜNZ, F.; VOBORNÝ, S.; HUBÁLEK, J.

Original Title

English Title

Epitaxy film of InN deposited in low-temperature MOCVD aparatus

Type

Functioning sample

Abstract

SEM, XPS a XRD analyza epitaxní vrstvy InN rostlé na safírovém substrátu metodou MOCVD.

Abstract in English

SEM, XPS and XRD analysis of epitaxy InN film growth on saphire substrate by MOCVD method.

Keywords

InN, epitaxy, SEM, XPS, XRD, MOCVD

Key words in English

InN, epitaxy, SEM, XPS, XRD, MOCVD

Location

CEITEC, Research group RG102

Licence fee

In order to use the result by another entity, it is always necessary to acquire a license

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