Publication result detail

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

PŘIKRYL, R. ČECH, V., HEDBAVNY, P., INAGAKI, N.

Original Title

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

English Title

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

Type

Paper in proceedings (conference paper)

Original Abstract

A novel plasma reactor has been developed in scope of the joint Czech-Japan project. The plasma system is aimed at preparation of functionally nanostructured thin films of high reproducibility. Controlled deposition of the nanostructured films is a new technological step for creative design and application of complex film systems in smart materials. Functionally gradient and/or multilayered nanostructured thin films of continuously or quasi-continuously varying physicochemical properties are worthwhile as compatible interlayers among distinct materials.

English abstract

A novel plasma reactor has been developed in scope of the joint Czech-Japan project. The plasma system is aimed at preparation of functionally nanostructured thin films of high reproducibility. Controlled deposition of the nanostructured films is a new technological step for creative design and application of complex film systems in smart materials. Functionally gradient and/or multilayered nanostructured thin films of continuously or quasi-continuously varying physicochemical properties are worthwhile as compatible interlayers among distinct materials.

Keywords

PE CVD, thin film, multilayer, gradient film

Key words in English

PE CVD, thin film, multilayer, gradient film

Authors

PŘIKRYL, R. ČECH, V., HEDBAVNY, P., INAGAKI, N.

Released

12.08.2005

Publisher

Centre for Advanced coatings Technology, University of Toronto

Location

Toronto, Kanada

Book

Proceedings of 17th symposium on plasma chemistry

Edition

2005

Pages from

1

Pages to

1

Pages count

6

BibTex

@inproceedings{BUT15156,
  author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}",
  title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films",
  booktitle="Proceedings of 17th symposium on plasma chemistry",
  year="2005",
  series="2005",
  pages="1--1",
  publisher="Centre for Advanced coatings Technology, University of Toronto",
  address="Toronto, Kanada"
}