Publication result detail

Thin film properties and stability of a potential molecular quantum bit based on copper(Iota Iota)

CICCULLO, F.; GLASER, M.; SÄTELLE, M.; LENZ, S.; NEUGEBAUER, P.; VAN SLAGEREN, J.; CASU, B.

Original Title

Thin film properties and stability of a potential molecular quantum bit based on copper(Iota Iota)

English Title

Thin film properties and stability of a potential molecular quantum bit based on copper(Iota Iota)

Type

WoS Article

Original Abstract

We have investigated the thin films of a copper(II) b-diketonate complex by using a multi-technique approach including X-ray photoelectron spectroscopy, high-frequency electron paramagnetic resonance, and magnetic circular dichroism spectroscopy. This complex, Cu(dbm)2 (Hdbm is dibenzoyl methane), is a potential molecular quantum bit. We have demonstrated that Cu(dbm)2 can be successfully evaporated under controlled conditions. We have further studied the stability of the obtained films in air down to the monolayer regime. The results show that Cu(dbm)2 thin films have very good stability, also in comparison to other potential molecular quantum bits. Understanding the stability of this class of materials plays an important role when moving from academic investigations to environments that mimic those of working devices. In this respect, thermally and air stable thin films are a key step towards applications.

English abstract

We have investigated the thin films of a copper(II) b-diketonate complex by using a multi-technique approach including X-ray photoelectron spectroscopy, high-frequency electron paramagnetic resonance, and magnetic circular dichroism spectroscopy. This complex, Cu(dbm)2 (Hdbm is dibenzoyl methane), is a potential molecular quantum bit. We have demonstrated that Cu(dbm)2 can be successfully evaporated under controlled conditions. We have further studied the stability of the obtained films in air down to the monolayer regime. The results show that Cu(dbm)2 thin films have very good stability, also in comparison to other potential molecular quantum bits. Understanding the stability of this class of materials plays an important role when moving from academic investigations to environments that mimic those of working devices. In this respect, thermally and air stable thin films are a key step towards applications.

Keywords

CHEMICAL-VAPOR-DEPOSITION; AMBIENT CONDITIONS; COPPER; METAL; OXIDE; PRECURSORS; COMPLEXES; OXIDATION; COHERENCE; SPECTRA

Key words in English

CHEMICAL-VAPOR-DEPOSITION; AMBIENT CONDITIONS; COPPER; METAL; OXIDE; PRECURSORS; COMPLEXES; OXIDATION; COHERENCE; SPECTRA

Authors

CICCULLO, F.; GLASER, M.; SÄTELLE, M.; LENZ, S.; NEUGEBAUER, P.; VAN SLAGEREN, J.; CASU, B.

RIV year

2019

Released

14.08.2018

ISBN

2050-7526

Periodical

Journal of Materials Chemistry C

Volume

6

Number

30

State

United Kingdom of Great Britain and Northern Ireland

Pages from

8028

Pages to

8034

Pages count

7

BibTex

@article{BUT151309,
  author="Francesca {Ciccullo} and Mathias {Glaser} and Marie S. {Sätelle} and Samuel {Lenz} and Petr {Neugebauer} and Joris {van Slageren} and Benedetta {Casu}",
  title="Thin film properties and stability of a potential molecular quantum bit based on copper(Iota Iota)",
  journal="Journal of Materials Chemistry C",
  year="2018",
  volume="6",
  number="30",
  pages="8028--8034",
  doi="10.1039/c8tc02610f",
  issn="2050-7526"
}