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MACH, J.; PROCHÁZKA, P.; BARTOŠÍK, M.; NEZVAL, D.; PIASTEK, J.; HULVA, J.; ŠVARC, V.; KONEČNÝ, M.; KORMOŠ, L.; ŠIKOLA, T.
Original Title
Electronic transport properties of graphene doped by gallium
English Title
Type
WoS Article
Original Abstract
In this work we present the effect of low dose gallium (Ga) deposition (<4ML) performed in UHV (10−7 Pa) on the electronic doping and charge carrier scattering in graphene grown by chemical vapor deposition. In situ graphene transport measurements performed with a graphene field-effect transistor structure show that at low Ga coverages a graphene layer tends to be strongly n-doped with an efficiency of 0.64 electrons per one Ga atom, while the further deposition and Ga cluster formation results in removing electrons from graphene (less n-doping). The experimental results are supported by the density functional theory calculations and explained as a consequence of distinct interaction between graphene and Ga atoms in case of individual atoms, layers, or clusters.
English abstract
Keywords
graphene, gallium, CVD, DFT, transport, doping
Key words in English
Authors
RIV year
2018
Released
13.10.2017
ISBN
0957-4484
Periodical
NANOTECHNOLOGY
Volume
28
Number
41
State
United Kingdom of Great Britain and Northern Ireland
Pages from
1
Pages to
10
Pages count
URL
https://pubmed.ncbi.nlm.nih.gov/28813368/
BibTex
@article{BUT139482, author="Jindřich {Mach} and Pavel {Procházka} and Miroslav {Bartošík} and David {Nezval} and Jakub {Piastek} and Jan {Hulva} and Vojtěch {Švarc} and Martin {Konečný} and Lukáš {Kormoš} and Tomáš {Šikola}", title="Electronic transport properties of graphene doped by gallium", journal="NANOTECHNOLOGY", year="2017", volume="28", number="41", pages="1--10", doi="10.1088/1361-6528/aa86a4", issn="0957-4484", url="https://pubmed.ncbi.nlm.nih.gov/28813368/" }