Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography

WoS Article

Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.

Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.

Plasmons, Nanopatterning, Nanostructures, Scanning electron microscopy, High pressure

Plasmons, Nanopatterning, Nanostructures, Scanning electron microscopy, High pressure

BABOCKÝ, J.; DVOŘÁK, P.; LIGMAJER, F.; HRTOŇ, M.; ŠIKOLA, T.; BOK, J.; FIALA, J.

2017

07.11.2016

1071-1023

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

34

6

United States of America

06K801-1

06K801-4

4