Publication result detail

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

Original Title

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

English Title

PECVD Characterization During the Deposition of Thin Fluorocarbon Films

Type

Abstract

Original Abstract

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

English abstract

This presentation focuses on plasma diagnostic of the deposition process during the preparation of the thin film prepared by a PECVD technique. The discharge was monitored using optical emission spectroscopy and in situ mass spectrometry.

Keywords

PECVD, fluorocarbon thin films, plasma diagnostics

Key words in English

PECVD, fluorocarbon thin films, plasma diagnostics

Authors

BALAŠTÍKOVÁ, R.; KRČMA, F.; TATOULIAN, M.

RIV year

2014

Released

28.04.2013

Publisher

Eindhoven University

Location

Eindhoven

Book

10th Frontiers in Low Temperature Plasma Diagnostics – Book of Abstracts

Pages from

P1-2

Pages to

P1-2

Pages count

1