Publication result detail

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

Original Title

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

English Title

Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process

Type

Abstract

Original Abstract

This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

English abstract

This work focuses on high density thin films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

Keywords

Thin film deposition, optical emission spectroscopy, oxygen transmission rate

Key words in English

Thin film deposition, optical emission spectroscopy, oxygen transmission rate

Authors

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

Released

07.12.2012

Publisher

FCH VUT

Location

Brno

ISBN

978-80-214-4545-8

Book

Studentská konference Chemie je život – Sborník abstraktů

Pages from

120

Pages to

120

Pages count

1

BibTex

@misc{BUT101784,
  author="Michal {Procházka} and Lucie {Janů} and František {Krčma} and Radek {Přikryl}",
  title="Plasma Enhanced Chemical Vapour Deposition of SiO2-Like Films: Monitoring and Optimization of the Process",
  booktitle="Studentská konference Chemie je život – Sborník abstraktů",
  year="2012",
  pages="120--120",
  publisher="FCH VUT",
  address="Brno",
  isbn="978-80-214-4545-8",
  note="Abstract"
}