Course detail

Preparation and properties of thin layers of materials

FCH-DCO_PTVAcad. year: 2015/2016

Terminology; liquid phase deposition: Langmuir-Blodgett films, self-assembled films, casting methods; introduction to vacuum science and plasma chemistry; chemical vapor deposition: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD; thin film characterization: film growth, film thickness and deposition rate, microscopic and spectroscopic techniques, properties and applications of thin films.

Language of instruction

Czech

Number of ECTS credits

0

Mode of study

Not applicable.

Guarantor

prof. RNDr. Vladimír Čech, Ph.D.

Department

Faculty of Chemistry (FCH)

Learning outcomes of the course unit

Advanced technologies and analyses of thin films.

Prerequisites

An introduction to thin films.

Co-requisites

Not applicable.

Planned learning activities and teaching methods

The course uses teaching methods in form of individual consultation. The e-learning system (LMS Moodle) is available to teachers and students.

Assesment methods and criteria linked to learning outcomes

Entrance written test and oral exam.

Course curriculum

Film deposition techniques
Film growth
Structural analyses of films
Chemical analysis of films
Film properties

Work placements

Not applicable.

Aims

Advanced technologies and analyses of thin films are the aims of this subject.

Specification of controlled education, way of implementation and compensation for absences

Optional attendance at lectures.

Recommended optional programme components

Not applicable.

Prerequisites and corequisites

Not applicable.

Basic literature

M. Ohring, Materials Science of Thin Films, Academic Press 2002. (CS)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998. (CS)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004. (CS)

Recommended reading

Not applicable.

Classification of course in study plans