Publication detail

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

OHLÍDAL, M. OHLÍDAL, I. KLAPETEK, P. NEČAS, D.

Original Title

Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry

Type

abstract

Language

English

Original Abstract

Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.

Keywords

Thin films, optical parameters

Authors

OHLÍDAL, M.; OHLÍDAL, I.; KLAPETEK, P.; NEČAS, D.

Released

29. 6. 2008

Publisher

Trinity College Dublin

Location

Dublin

Pages from

M-P43

Pages to

M-P43

Pages count

1