Publication detail

Growth of In2O3(111) thin films with optimized surfaces

FRANCESCHI, G. WAGNER, M. HOFINGER, J. KRAJŇÁK, T. SCHMID, M. DIEBOLD, U. RIVA, M.

Original Title

Growth of In2O3(111) thin films with optimized surfaces

Type

journal article in Web of Science

Language

English

Original Abstract

Indium oxide is widely employed in applications ranging from optoelectronics and gas sensing to catalysis, as well as in thin-film heterostructures. To probe the fundamentals of phenomena at the heart of In2O3-based devices that are tied to the intrinsic surface and interface properties of the material, well-defined single-crystalline In2O3 surfaces are needed. We report on how to grow atomically flat In2O3(111) thin films on yttria-stabilized zirconia substrates by pulsed laser deposition. The films are largely relaxed and reproduce the atomic-scale details of the surfaces of single crystals, except for line defects originating from the antiphase domain boundaries that form because of the one-on-four lattice match between the surface unit cells of In2O3(111) and of the substrate. While optimizing the growth conditions, we observe that the morphology of the films is ruled by the oxygen chemical potential, which determines the nature and diffusivity of adspecies during growth.

Keywords

OXIDE; MORPHOLOGY; MOBILITY

Authors

FRANCESCHI, G.; WAGNER, M.; HOFINGER, J.; KRAJŇÁK, T.; SCHMID, M.; DIEBOLD, U.; RIVA, M.

Released

10. 10. 2019

ISBN

2475-9953

Periodical

PHYSICAL REVIEW MATERIALS

Year of study

3

Number

10

State

United States of America

Pages from

103403

Pages to

103403

Pages count

10

URL

https://journals.aps.org/prmaterials/abstract/10.1103/PhysRevMaterials.3.103403

BibTex

@article{BUT159387,
  author="Giada {Franceschi} and Margareta {Wagner} and Jakob {Hofinger} and Tomáš {Krajňák} and Michael {Schmid} and Ulrike {Diebold} and Michele {Riva}",
  title="Growth of In2O3(111) thin films with optimized surfaces",
  journal="PHYSICAL REVIEW MATERIALS",
  year="2019",
  volume="3",
  number="10",
  pages="103403--103403",
  doi="10.1103/PhysRevMaterials.3.103403",
  issn="2475-9953",
  url="https://journals.aps.org/prmaterials/abstract/10.1103/PhysRevMaterials.3.103403"
}