Publication result detail

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Original Title

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

English Title

Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films

Type

Paper in proceedings (conference paper)

Original Abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

English abstract

The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.

Keywords

Plasma thin layer deposition, organosilicone films, optical emission spectroscopy

Key words in English

Plasma thin layer deposition, organosilicone films, optical emission spectroscopy

Authors

RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.

Released

25.06.2003

Publisher

IUPAC

Location

Taormina

Book

Proceedings of ISPC XVI

Pages from

1

Pages count

6

BibTex

@inproceedings{BUT8829,
  author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}",
  title="Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films",
  booktitle="Proceedings of ISPC XVI",
  year="2003",
  number="1",
  pages="6",
  publisher="IUPAC",
  address="Taormina"
}