Detail publikace

Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers

CHOMOUCKÁ, J. DZIK, P. VESELÝ, M. DRBOHLAVOVÁ, J.

Originální název

Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.

Klíčová slova

photoctalytic degradation, formic acid

Autoři

CHOMOUCKÁ, J.; DZIK, P.; VESELÝ, M.; DRBOHLAVOVÁ, J.

Rok RIV

2008

Vydáno

9. 9. 2008

Nakladatel

ČSCH

Místo

Praha

ISSN

1213-7103

Periodikum

Chemické listy

Ročník

102

Číslo

15

Stát

Česká republika

Strany od

s986

Strany do

s988

Strany počet

3

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