FCH-BAO_TPVAcad. year: 2020/2021
Terminology; fundamentals of vacuum science; introduction to plasma physics and chemistry; film deposition techniques: vacuum evaporation, sputtering, plasma polymerization, laser-enhanced CVD, CVD processes; thin film characterization: film growth, film thickness and deposition rate, scanning probe microscopy (STM, AFM, EFM, MFM, SNOM), mechanical properties (measurement techniques, internal stress, adhesion).
Offered to foreign students
Of all faculties
Learning outcomes of the course unit
Students acquire basic knowledge about thin-film technology, characterization and application. They can use this knowledge in their diploma thesis and later as technologists and researchers.
Basic chemistry and physics.
Recommended optional programme components
Recommended or required reading
M. Ohring, Materials Science of Thin Films, Academic Press 2002 (EN)
D. Hoffman, B. Singh, J.H. Thomas, Handbook of Vacuum Science and Technology, Academic Press 1998 (EN)
V. L. Mironov, Fundamentals of Scanning Probe Microscopy, NT-MDT 2004 (EN)
N. Inagaki, Plasma Surface Modification and Plasma Polymerisation. Lancaster: Technomic Publ., 1996 (EN)
Planned learning activities and teaching methods
The course uses teaching methods in form of Lecture - 2 teaching hours per week. The e-learning system (LMS Moodle) is available to teachers and students.
Assesment methods and criteria linked to learning outcomes
Entrance written test and oral exam are aimed at basic knowledge about thin film technologies and thin film characterization.
Language of instruction
Introduction / information sources
Fundamentals of vacuum science
Introduction to plasma physics and chemistry
Physical vapor deposition
Chemical vapor deposition
Plasma-enhanced chemical vapor deposition
Scanning probe microscopy
Knowledge about advanced technologies and analyses of thin films is the aims of this subject.
Specification of controlled education, way of implementation and compensation for absences
Optional attendance at lectures.