Publication detail

Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

BÁBOR, P. MAŠEK, K.

Original Title

Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.

English Title

Methods of surface and thin film analysisof chemical composition, photoelectron diffraction

Type

journal article - other

Language

Czech

Original Abstract

The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

English abstract

The goal of this article is to provide basic information on the physical principles and applications of the following mentioned methods. Chemical composition belongs to the basic characterization of materials used in many technological applications. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are widely used for the investigation of chemical composition as well as of chemical state of solid surfaces. X-ray photoelectron diffraction (XPD) is a technique providing information on the detail crystallographic structure of single-crystal surfaces and epitaxial thin films of geometry of bonding ordered adsorbates. Secondary ion mass spectroscopy (SIMS) is more sensitive for measurement of low concentration species comparing to the electron spectroscopy techniques and, in addition, it permits elemental and compositional depth profiling.

Keywords

XPS, AES, SIMS, fotoelektronová difrakce

Key words in English

XPS, AES, SIMS, photoelectron spectroscopy

Authors

BÁBOR, P.; MAŠEK, K.

RIV year

2011

Released

1. 12. 2011

ISBN

1211-5894

Periodical

Materials Structure

Year of study

2011

Number

18

State

Czech Republic

Pages from

251

Pages to

257

Pages count

7

BibTex

@article{BUT89985,
  author="Petr {Bábor} and Karel {Mašek}",
  title="Metody povrchové a tenkovrstvové analýzy prvkového složení (XPS, AES, SIMS), dirfrakce elektronů.",
  journal="Materials Structure",
  year="2011",
  volume="2011",
  number="18",
  pages="251--257",
  issn="1211-5894"
}