Optimization of Fabrication Parameters for Atomic Force Microscopy Probes to Improve Image Resolution and Analysis

Optimization of Fabrication Parameters for Atomic Force Microscopy Probes to Improve Image Resolution and Analysis

Paper in proceedings (conference paper)

This study is part of a broader initiative to develop a comprehensive metric system for optimizing the fabrication of ultra-sharp Atomic Force Microscopy (AFM) probe tips. The system integrates data from multiple characterization techniques, including Focused Ion Beam (FIB) milling and Scanning Electron Microscopy (SEM) for morphological analysis, and Raman spectroscopy for assessing material composition. Detailed topographical and scanning data from AFM further inform the metric framework. Additionally, advanced simulations are conducted to model the distribution of the electric field between the sharp probe tip and the scanned surface. Electron behavior at the nanoscale interface is investigated using Monte Carlo and Molecular Dynamics simulations, providing insight into tip-surface interactions. Statistical and computational analyses are applied to identify correlations among fabrication parameters and performance indicators. This multifaceted approach aims to uncover the fundamental physical principles governing probe behavior, ultimately enhancing the precision, efficiency, and reproducibility of AFM probe fabrication for applications in nanotechnology and surface science. © 2025, Brno University of Technology. All rights reserved.

This study is part of a broader initiative to develop a comprehensive metric system for optimizing the fabrication of ultra-sharp Atomic Force Microscopy (AFM) probe tips. The system integrates data from multiple characterization techniques, including Focused Ion Beam (FIB) milling and Scanning Electron Microscopy (SEM) for morphological analysis, and Raman spectroscopy for assessing material composition. Detailed topographical and scanning data from AFM further inform the metric framework. Additionally, advanced simulations are conducted to model the distribution of the electric field between the sharp probe tip and the scanned surface. Electron behavior at the nanoscale interface is investigated using Monte Carlo and Molecular Dynamics simulations, providing insight into tip-surface interactions. Statistical and computational analyses are applied to identify correlations among fabrication parameters and performance indicators. This multifaceted approach aims to uncover the fundamental physical principles governing probe behavior, ultimately enhancing the precision, efficiency, and reproducibility of AFM probe fabrication for applications in nanotechnology and surface science. © 2025, Brno University of Technology. All rights reserved.

AFM; electrochemical etching; Metric System; Microscopy; Parameter Optimization; Probe Fabrication; SEM; Sharp probe; Tip convolution effect

AFM; electrochemical etching; Metric System; Microscopy; Parameter Optimization; Probe Fabrication; SEM; Sharp probe; Tip convolution effect

MISIUREV, D.; HOLCMAN, V;

2026

29.03.2025

Brno University of Technology

Brno

9788021463219

Proceedings II of the Conference Student EEICT

Proceedings II of the Conference STUDENT EEICT

Czech Republic

285

290

5

https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2025_sbornik_1.pdf