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TOMÍČEK, P.; BOUŠEK, J.
Original Title
Effects of gate boosting on gate oxide reliability and lifetime estimation of commercially available MOSFETs
English Title
Type
Paper in proceedings (conference paper)
Original Abstract
This paper presents a method of estimating gate oxide reliability and lifetime of commercially available MOSFETs. The estimation is calculated for the specific condition that is present when gate boosting is used as a gate driving method. The effects of overvoltage are presented as well as calculation of the expected lifetime of a MOSFET when gate boosting is used.
English abstract
Keywords
MOSFET, gate oxide reliability, lifetime, gate boosting
Key words in English
Authors
Released
29.04.2025
Publisher
Brno University of Technology, Faculty of Elektronic Engineering and Communication
Location
Brno
ISBN
978-80-214-6321-9
Book
Proceedings I of the 31st Conference STUDENT EEICT 2025
Edition
1
Pages from
266
Pages to
270
Pages count
5
URL
https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2025_sbornik_1.pdf
BibTex
@inproceedings{BUT198661, author="Pavel {Tomíček} and Jaroslav {Boušek}", title="Effects of gate boosting on gate oxide reliability and lifetime estimation of commercially available MOSFETs", booktitle="Proceedings I of the 31st Conference STUDENT EEICT 2025", year="2025", series="1", pages="266--270", publisher="Brno University of Technology, Faculty of Elektronic Engineering and Communication", address="Brno", isbn="978-80-214-6321-9", url="https://www.eeict.cz/eeict_download/archiv/sborniky/EEICT_2025_sbornik_1.pdf" }